Absorptive Neutral Density Filters UV-VIS-NIR

Absorptive Neutral Density Filters UV-VIS-NIR
With their ability to minimize back-reflections and scattered light, absorptive neutral density (ND) filters are ideal for calibration.
In contrast to the metallic type, absorption-type filters achieve their optical density by absorbing light within the substrate. For this reason, thickness is a key determinant of opacity. Because of their absorbing quality, these filters are suitable for low-power applications only.
Andover's absorbing ND filters are unique in that they are AR coated to reduce surface reflections. Polished to TWF 1/4 wave or better, this enables them to be stacked without concern about losses and artifacts due to multiple reflections. Absorbing ND filters are perfect for imaging applications.
Please note that all of our Absorbing ND filters are also available in sets, which include a hardwood storage box.
- AR coatings minimize surface reflections and back-scatter
- Superior transmitted wavefront quality enables filter stacking
- Excellent uniformity across the visible to near-IR spectrum
- Minimal polarization effects
- High optical quality for demanding imaging applications
- Available individually or in calibrated sets with storage
- Stable performance in controlled environments
- Precision optical density control
- High-resolution photomicrography
- Precision machine vision systems
- Optical calibration equipment
- Scientific imaging
- Research instrumentation
- Photometric measurements
- Quality control inspection
- Digital imaging systems
- Thickness: 5.0mm maximum
- Dimensional Tolerance: +0.0/-0.25mm
- Clear Aperture: 90% of outside dimension
- Surface Quality: 80/50 per MIL-0-13830B
- Operating Temperature Range: Up to +100°C
- Substrate Material: Schott absorption glass
- Spectral Range: 450-700nm
- Transmitted Wavefront: λ/4 per inch
- Parallelism: 30 arc seconds or better
- Configuration: Unmounted (mounting options available)
Showing 1–16 of 30 results
- %T (Optical Density): 79.43 ( 0.1 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 75.9% to 83.2%
- Substrate Material: NG-12
- Size: 25.0 Ø
- Thickness: 4.95
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-12
- %T (Optical Density): 79.43 ( 0.1 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 75.9% to 83.2%
- Substrate Material: NG-12
- Size: 50.0 x 50.0
- Thickness: 4.95
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-12
- %T (Optical Density): 63.10 ( 0.2 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 60.2% to 66.1%
- Substrate Material: NG-11
- Size: 25.0 Ø
- Thickness: 1.52
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-11
- %T (Optical Density): 63.10 ( 0.2 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 60.2% to 66.1%
- Substrate Material: NG-11
- Size: 50.0 x 50.0
- Thickness: 1.52
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-11
- %T (Optical Density): 50.12 ( 0.3 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 46.8% to 53.7%
- Substrate Material: NG-11
- Size: 25.0 Ø
- Thickness: 2.84
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-11
- %T (Optical Density): 50.12 ( 0.3 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 46.8% to 53.7%
- Substrate Material: NG-11
- Size: 50.0 x 50.0
- Thickness: 2.84
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-11
- %T (Optical Density): 39.81 ( 0.4 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 36.3% to 43.7%
- Substrate Material: NG-11
- Size: 25.0 Ø
- Thickness: 3.78
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-11
- %T (Optical Density): 39.81 ( 0.4 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 36.3% to 43.7%
- Substrate Material: NG-11
- Size: 50.0 x 50.0
- Thickness: 3.78
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-11
- %T (Optical Density): 31.62 ( 0.5 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 28.2% to 35.5%
- Substrate Material: NG-5
- Size: 25.0 Ø
- Thickness: 2.11
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-5
- %T (Optical Density): 31.62 ( 0.5 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 28.2% to 35.5%
- Substrate Material: NG-5
- Size: 50.0 x 50.0
- Thickness: 2.11
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-5
- %T (Optical Density): 25.12 ( 0.6 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 21.9% to 28.8%
- Substrate Material: NG-5
- Size: 25.0 Ø
- Thickness: 2.54
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-5
- %T (Optical Density): 25.12 ( 0.6 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 21.9% to 28.8%
- Substrate Material: NG-5
- Size: 50.0 x 50.0
- Thickness: 2.54
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-5
- %T (Optical Density): 19.95 ( 0.7 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 17.0% to 23.4%
- Substrate Material: NG-5
- Size: 25.0 Ø
- Thickness: 2.95
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-5
- %T (Optical Density): 19.95 ( 0.7 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 17.0% to 23.4%
- Substrate Material: NG-5
- Size: 50.0 x 50.0
- Thickness: 2.95
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-5
- %T (Optical Density): 15.85 ( 0.8 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 13.2% to 19.0%
- Substrate Material: NG-5
- Size: 25.0 Ø
- Thickness: 3.38
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-5
- %T (Optical Density): 15.85 ( 0.8 OD )
- Specifications: ° A/R Coat both sides.° Thickness may vary with melt #° Tx @ 550nm = 13.2% to 19.0%
- Substrate Material: NG-5
- Size: 50.0 x 50.0
- Thickness: 3.38
- Scratch-Dig: 80/50
- Clear Aperture: 90%
- Flatness: 0.25 wave per inch or better
- Parallelism: 30 arc seconds or better
- Substrate: NG-5